Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year

Product Description

📋 Basic Information
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Weight
4000 Kg
Technology
Physical Vapor Deposition
Method
Magnetron Sputtering
Operation
Automatic, Manual
PVD Power Source
Hipims, DC, Mf, RF
HS Code
8543300090
Product Description

Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

The equipment features a reasonable structure, ensuring even coating quality, fast pumping speeds, short cycles, and high efficiency. It offers easy operation, low energy consumption, and stable performance advantages. This system is widely utilized across various industries including automotive parts, audio equipment, small appliances, computers, timepieces, toys, mobile phones, reflective cups, and cosmetics.

⚙️ MF Sputtering Technology

DC magnetron sputtering coating machines are designed for direct sputtering applications on diverse substrates including various plastics, glass, metals, and ceramics.

With over a decade of experience in designing magnetrons (rectangular, cylindrical, circular), we develop specialized targets that can be directly cooled or bonded to fit most magnetron dimensions. Magnetic field modeling is key to defining the behavior of ion-charged particles, enhancing productivity and reproducibility in commercial applications.

Technical Specifications
Model Number SP-1000 SP-1200 SP-1400 SP-1800
Vacuum Chamber Dim (Dia*H) 1000*1100 1200*1400 1400*1600 1800*2000
Chamber Material Carbon steel, SUS304 or SUS316L
Sputtering Cathodes ≥1 sets, DC sputtering system, cylindrical or rectangle
Pumping System Turbo molecular pumps or diffusion pump + mechanical pump
Pumping Time Atmosphere to 5.0*10-2Pa < 8 minutes
Ultimate Vacuum 5.0*10-4 Pa
Total Power 40-100kW 70-1000kW

* All specifications can be customized according to specific requests.

🛠️ Essential Components & Accessories

We provide all necessary parts for daily production requirements:

  • Vacuum pumps & Meters
  • DC/Unbalanced Sputtering Cathodes
  • O-rings & Magnetic Valves
  • Bias Power Supplies
  • Mass Flow Controllers (MFC)
  • High-quality Target Materials
  • Customized Jigs
Component Divider
🖼️ Equipment Gallery
Frequently Asked Questions
What types of substrates can be coated using this system?
The system is highly versatile and can coat various substrates including steel, plastics, glass, ceramics, and other metal alloys.
Is the sputtering process fully automated?
Yes, the system features both Automatic and Manual modes, controlled via a high-resolution PLC touch screen (10.4 or 15 inches).
How long does the vacuum pumping process take?
The system is designed for efficiency, reaching 5.0*10-2Pa from atmospheric pressure in less than 8 minutes.
Can the vacuum chamber dimensions be customized?
Absolutely. We offer customized chamber sizes, sputtering cathode quantities, and pump configurations to meet your specific production needs.
What power sources are supported for sputtering?
The equipment supports multiple power source types including Hipims, DC, MF (Medium Frequency), and RF (Radio Frequency).
What industries commonly use this thin film deposition system?
It is widely used in automotive, electronics, mobile phone manufacturing, toy production, and functional cosmetic packaging.

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