| Customization: | Available |
|---|---|
| Warranty: | One Year |
| Type: | Coating Production Line |
Vacuum Plating Thin Film Magnetron Sputtering PVD Coating Systems
Magnetron Sputtering Coater Introduction:
Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for selection based on substrate size. Equipped with three 300W RF power supplies, it is suitable for non-metal preparation. The three-target configuration meets multi-layer or multiple coating requirements. Custom DC or pulse power supplies (300W to 1000W) are also available.
The system features a two-channel high-precision mass flowmeter (expandable to four), advanced turbomolecular pump sets reaching ultimate vacuum of 1.0E-5Pa, and solenoid-valve controlled gas paths allowing sample exchange without shutting down the pump. An integrated industrial computer can be equipped to control vacuum and sputtering parameters, enhancing experimental efficiency.
Applications:
Ideal for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and PTFE films. Its compact size and ease of operation make it a preferred choice for material research laboratories.
| Sample Stage | Size: φ185mm | Temp. Accuracy: ±1ºC |
| Heating: Max 500ºC | Rotate Speed: 1-20rpm | |
| Target Head | Quantity: 2" × 3 (1",2" optional) | Water Chiller: 10L/min flow |
| Cooling: Water Cooling | - | |
| Vacuum Chamber | Size: φ300mm × 300mm | Watch Window: φ100mm |
| Material: Stainless Steel | Opening: Top cover open | |
| Mass Flowmeter | 2 channels; range 100sccm (customizable) | |
| Vacuum System | Molecular pump: 600L/S; Ultimate vacuum: 1.0E-5Pa; Vacuum up to 1.0E-3Pa in 20 mins | |
| Power | RF power supply × 3; Max output: RF 300 W | |
| Dimensions | 600mm × 650mm × 1280mm; Total Weight: 300kg | |
Other Magnetron Sputtering Coaters & Production Facility:
Founded in 2005, the company specializes in developing and producing laboratory technology research equipment. The product range includes equipment for mixing, pressing, burning, cutting, grinding, polishing, coating, and analysis. Our sintering and coating equipment have been exported to 25 countries including the United States and regions across Europe and Southeast Asia.
We maintain a mature R&D team with 33 technicians and a total staff of 150. Operating within a 1,500 square meter facility, we primarily serve scientific research labs in universities and colleges, offering standard and customized products to meet specific experimental needs.
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