DTRX Orthopedic Implants
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Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The electric system accords with the CE criterion, widely used in the fields of micro-electronics, nano materials, optical films, solar batteries, etc.
Advanced software controlling system: Many functions are integrated in the system, including technological formulation, parameter setting, popedom setting, interlocking alarming and state supervisory control.
| Parameter Item | Specification Details |
|---|---|
| Wafer Dimension | 8 inch and below |
| Wafer temperature | RT-400ºC, Controlling precision ±0.1ºC |
| Number of precursor | Three precursor lines, optional more lines |
| Temperature of precursor lines | RT-200ºC, Controlling precision ±0.1ºC |
| Temperature of source bottles | RT-200ºC, Controlling precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Background vacuum | <5*10-3 Torr |
| Gas carrier system | N2 or Ar |
| Growing mode | Consecutive or interval deposition mode |
| Controlling system | PLC plus touch screen or display |
| Power supply | 50-60Hz, 220V/20A AC |
| Deposition Heterogeneity | Heterogeneity < ±1% |
| Dimension of the instrument | 600mm x 600mm x 1100mm |
